Thin Film Coating(CVD) - List of Manufacturers, Suppliers, Companies and Products

Toho Chemical Industry Co., Ltd. Business Introduction

Over 30 years of experience in contract processing! With improved technology, we aim for further innovation!

Toho Kaken Co., Ltd. offers contract processing services for thin film coatings using ion plating (PVD), vacuum deposition, plasma CVD, sputtering, and other methods that are optimal for surface treatment. We particularly focus on functional films such as conductive and insulating films, and we have established a system to meet a wide range of requests from prototyping, development, research, mass production, to small lot production. We strive for prompt and reliable responses from quotations to processing, and we contribute to reducing lead times. 【Business Description】 ■ Contract processing services for thin films using ion plating and vacuum deposition (Production of functional films, surface modification, and general thin film processing) For more details, please refer to our catalog or feel free to contact us.

Company：東邦化研
Price：Other

Surface treatment contract service

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Technical Data: Possibilities of Thin Film Production Using Excimer Lamps

Utilizing high-output xenon excimer lamps! Introduction to the film deposition rate of the light CVD method.

By forming a thin film on the surface of metals and polymer materials, it is possible to control the mechanical, thermal, chemical, and electrical properties of the material's surface. Various methods are employed for the film formation of thin films used in this surface modification, including vacuum deposition, PVD, and plasma CVD methods. It is expected that the exploration and development of new film formation methods will continue in the future. In this document, we present the results of our examination of the potential of a thin film manufacturing process using a "high-output xenon excimer lamp." [Contents] ■ Introduction ■ Film formation speed of the photochemical CVD method using a "high-output xenon excimer lamp" ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.

Company：クォークテクノロジー
Price：Other

Ultraviolet irradiation equipment

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MiniLab Series Flexible Thin Film Experiment Device

Due to its modular embedded design, it is possible to flexibly assemble dedicated equipment according to the required film formation method. A compact thin-film experimental device that can accommodate various research applications.

**Flexible System** The MiniLab thin film experimental device series allows for easy construction of a compact device configuration without waste, even as a customized product, by incorporating suitable components (such as deposition sources and stages) and control modules according to the required deposition methods and materials from a wide range of options. By configuring the device with a modular control unit in a Plug&Play manner, the application range expands, enabling various thin film process experiments. The MiniLab series is a high cost-performance system that caters to a wide range of applications from research and development to small-scale production. **Small Footprint & Space Saving** - Single Rack Type (MiniLab-026): 590(W) x 590(D)mm - Dual Rack Type (MiniLab-060): 1200(W) x 590(D)mm - Triple Rack Type (MiniLab-125): 1770(W) x 755(D)mm **Excellent Operability & Intuitive Operation Screen** Windows PC or 7” touch panel. Easy operation that does not require advanced skills, while ensuring maximum safety.

Company：テルモセラ・ジャパン本社
Price：Other

Sputtering Equipment

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Presentation of materials: "Technical Documentation on Surface Treatment Thin Film Coating"

We are offering a technical document that explains thin film processing technology that imparts new functions to materials! It includes various surface treatment and thin film coating methods! We support everything from prototypes to production projects.

Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We have established a system to respond to a wide range of requests, from small-scale projects such as prototypes, development, and research to medium-sized production projects, accommodating various types of films including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their multilayer films. Please feel free to contact us when considering functional thin films! Based on our flexible response and over 35 years of experience, we will meet your needs! Additionally, this document includes features of each coating method, as well as coating examples and pattern formation. If you are interested, please download the materials or feel free to contact us.

Company：東邦化研
Price：Other

Circuit board design and manufacturing
Other processing machines

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Thin Film Coating Service

New properties for materials! Contract surface treatment processing that meets the needs for forming with various materials.

Toho Kaken Co., Ltd. has been providing contract processing for various surface treatments using ion plating, vacuum deposition, sputtering, and P-CVD for many years. We can accommodate a wide range of projects, from prototype development to medium and small lot production. We respond to the needs for thin film formation using various materials such as single metals, oxides, nitrides, and carbides. 【Service Features】 ■ Support for prototypes and small lots ■ Compatibility with various materials ■ Use of equipment tailored to specifications, materials, and processes ■ Consideration for the environment For more details, please refer to our catalog or feel free to contact us.

Company：東邦化研
Price：Other

Surface treatment contract service

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Conductive film production device "Osmium Plasma Coater"

Solve your problems with electron microscope observation! It is highly effective in preventing charge-up and reducing granularity and thermal damage.

The "Osmium Plasma Coater" is a device for producing conductive thin films for electron microscope samples using the "plasma film formation method in the negative glow region by direct current glow discharge." With the plasma CVD method, amorphous osmium conductive thin films (osmium coating) can be formed in a short time. A highly robust and smooth conductive thin film can be obtained without causing thermal damage to the sample. 【Features】 ■ Fully automatic operation ■ Detachable osmium sublimation chamber/ naphthalene sublimation chamber ■ Ability to check the remaining amount of osmium/naphthalene ■ Short film formation time (a few nm/ a few seconds) ■ Ampoule has a safe structure that breaks inside the sublimation chamber *For more details, please refer to the PDF document or feel free to contact us.

Company：フィルジェン
Price：Other

Analytical Equipment and Devices

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About FHR Anlagenbau GmbH

Introducing FHR, which offers excellent technical capabilities and high-quality bonded sputtering targets!

FHR Anlagenbau GmbH is an innovative company in the field of vacuum processes and thin film technology. It was established in 1991 in Dresden, Germany, by a group of engineers with excellent technical skills aimed at developing and selling new concepts and solutions for multiple applications of thin films. FHR provides thin film technology and offers customized equipment for a wide range of applications to customers worldwide. [Included in the FHR Technology Portfolio] ■ Advanced metallization technology through magnetron sputtering and CVD ■ Reactive sputtering technology for the deposition of oxides and nitrides ■ Advanced etching technology supported by high-density plasma sources ■ Flash lamp annealing (FLA) for processing and modifying semiconductors, metals, ceramics, nanostructures, and photonic materials ■ Atomic layer deposition (ALD) technology for single-layer bonding with excellent uniformity through advanced film deposition control on complex 3D shapes *For more details, please refer to the PDF document or feel free to contact us.

Company：ティー・ケイ・エス
Price：Other

others

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A free guidebook titled "Thin Film Q&A" with explanations of thin film processing technology is currently available!

We will give you a free copy of "Thin Film Q&A," which summarizes the differences and characteristics of various coating methods, coating examples, and frequently asked questions!

We are currently offering a free document that explains thin film processing technology, which imparts new functions to materials, in an easy-to-understand Q&A format! - What is vacuum deposition? - What is ion plating? - What kind of films can be created? - What types of coatings can be done? - Is it okay to only do prototypes? Can mass production be done? Toho Chemical Industry Co., Ltd. provides contract processing services for thin film coatings using ion plating (PVD), vacuum deposition, plasma CVD, sputtering, and other suitable surface treatment methods. Since the establishment of our ion plating division, we have accumulated approximately 40 years of achievements across a wide range of fields. We have compiled a list of frequently asked questions. We have summarized the differences and characteristics of each coating method, as well as specific examples of coatings, using illustrations and photos to make it as easy to understand as possible, so please feel free to download it. Based on our flexible response and over 35 years of experience, we will meet your needs! If you are considering functional thin films, please do not hesitate to contact us! If you have any questions, please feel free to reach out to us first!☆

Company：東邦化研
Price：Other

Surface treatment contract service
Sputtering Equipment
Ceramics

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Toho Kaken Co., Ltd. "Coating Contract Processing Achievements"

Over 30 years dedicated to contract thin film processing! Processing achievements cultivated through rich experience and reliable technology.

We would like to introduce the processing achievements of Toho Kaken Co., Ltd.'s surface treatment thin film coating contract processing services. We have a proven track record in various types of films, including single metal films, oxide films, carbide films, nitride films, alloy films, optical films, and multilayer films (laminated films). 【Applicable Fields】 ■ Electrical and electronic components: electrode films, insulating films, surface protection films, transparent conductive films, etc. ■ Vacuum equipment parts: contamination prevention, insulating films, bonding metals, etc. ■ Aerospace-related: weight reduction, corrosion resistance, solid lubrication, etc. ■ Mechanical parts and molds: wear resistance, release properties, corrosion resistance, surface hardening, etc. For more details, please refer to our catalog or feel free to contact us.

Company：東邦化研
Price：Other

Surface treatment contract service

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Contract processing service for functional thin films

Flexible response and 30 years of experience! A high-performance contract processing service that meets a wide range of requests.

Toho Kaken Co., Ltd. offers contract processing services for functional thin films with properties such as conductivity, insulation, and corrosion resistance through ion plating, vacuum deposition, P-CVD, and sputtering. We accommodate various functional thin films from prototyping to production. Based on 35 years of experience, we provide flexible responses to film types, film thickness, deposition conditions, and compatible substrates (materials, sizes, shapes), and we also support masking deposition and pattern formation using metal masks. Please feel free to consult with us. For more details, please refer to our catalog or feel free to contact us.

Company：東邦化研
Price：Other

Surface treatment contract service

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Vacuum deposition method

We can handle over 50 types of thin film coatings, even from just one piece! Leave thin film formation to us!

A thin film, referred to as "hakumaku" or "usumaku," generally refers to a coating (film) with a thickness at the nano level. Thin films are formed by evaporating or sputtering the material (such as metal) that is to be made into a film within a vacuum apparatus. **"Vacuum Deposition Method"** The vacuum deposition method is a technique where the material (such as metal) intended for the film is heated and evaporated in a vacuum, allowing the vapor (particles) to reach the target object and accumulate to form a film. The vacuum deposition method is characterized by the fact that the vaporized material reaches the target object directly, resulting in minimal damage to the object and the formation of a highly pure film. Toho Kaken Co., Ltd. offers contract processing services for functional thin films with properties such as conductivity, insulation, and corrosion resistance using ion plating, vacuum deposition, P-CVD, and sputtering. We accommodate various functional thin films from prototyping to production. Based on our 35 years of experience, we offer flexible responses to film types, film thickness, deposition conditions, and compatible substrates (materials, sizes, shapes), and we also support masking deposition and pattern formation using metal masks. Please feel free to consult with us.

Company：東邦化研
Price：Other

Sensors

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CX coating, waterproof, moisture-proof, biocompatibility, free coating also accepted.

CX coating possesses properties such as waterproofing, moisture resistance, insulation, and biocompatibility. It forms a thin, transparent film through room temperature processing. Let's protect medical and electronic components.

CX coating can protect products in the medical and electronic component markets from various factors as a multifunctional high-performance coating. ◆ Waterproof and Moisture-Proof Our lineup of PPX single-layer films and CX coat + SiO2 laminated films excels in waterproof and moisture-proof performance. In particular, by layering our technology, PPX and SiO2, we achieve performance that is 400 to 1000 times better than conventional PPX single-layer films. ◆ Chemical Resistance This PPX coating has high chemical stability and is very resistant to basic acids and alkalis. If you are considering use near chemicals, testing with our films may be very effective. ◆ Heat Resistance and Insulation Depending on the type of film, PPX coatings can have heat resistance up to about 350°C. Insulation properties vary with film thickness, affecting breakdown voltage. We select the type of film based on the application and make recommendations to our customers. We can provide the above performance with a thin film coating (5μm). Our standard film thickness is recommended at 5μm, and we can propose and consult on film thickness based on application and environment. We also accept free coating requests, so please feel free to inquire!

Company：オーエスジー株式会社グループ
Price：Other

Other electronic parts
Surface treatment contract service
Plasma surface treatment equipment

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Thin Film Experimental Device - "PRODUCTS GUIDE 2022"

Introduction of various experimental devices for research and development in semiconductors, electronic devices, fuel cells, displays, and thin film experiments.

Introducing various thin film experimental devices and components for research and development fields. 【nano Benchtop Series】 High performance! nano Benchtop series thin film experimental devices Compact size housing high-functionality and high-spec thin film equipment. 【MiniLab Flexible Thin Film Experimental Device】 A "flexible experimental device" that combines various device configurations and necessary components according to required specifications.

Company：テルモセラ・ジャパン本社
Price：Other

Sputtering Equipment
Evaporation Equipment
Annealing furnace

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Multi-functional Sputtering Device 【MiniLab-S060】

A compact multi-thin film device that incorporates sputtering, deposition, electron beam (EB), and annealing thin film modules in a 60-liter volume chamber, suitable for various applications.

4 cathodes with Φ2 inch mounted Simultaneous film formation: 3-component simultaneous film formation (RF 500W or DC 850W) + HiPIMS (Pulse DC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed from the HMI screen using the plasma relay switch MFC x 3 systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coat) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Plasma etching can be installed in either the main chamber or the load lock chamber. ● Mixed specifications such as resistance heating deposition, organic material deposition, EB deposition, and PECVD can also be configured.

Company：テルモセラ・ジャパン本社
Price：Other

Sputtering Equipment
Evaporation Equipment
CVD Equipment

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Thin Film Coating(CVD) - List of Manufacturers, Suppliers, Companies and Products

Thin Film Coating Product List